Lynx Metrology System Launched
Nanometrics announced new Lynx system that provides for a range of custom configurations.
Latest News
July 31, 2008
By DE Editors
Nanometrics Incorporated (Milpitas, CA) announced the launch of its new Lynx metrology platform at SEMICON West 2008 in July. The Lynx is a compact 300mm cluster metrology platform that makes possible thin film, optical critical dimension (OCD) and overlay measurements in a single system. The Lynx provides for a range of custom configurations, from one single metrology platform to a multi-metrology platform. To extend system capabilities, modules can be easily installed or upgraded.
Nanometrics’ proprietary cluster control software allows for “sequence and recipe customization in a high-volume production environment.” The Lynx’s cluster architecture is responsible for a significant cost of ownership improvement, and allows customers to configure each tool to suit their process control and sampling requirements.
For more information, visit Nanometrics.
Sources: Press materials received from the company and additional information gleaned from the company’s website.
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DE EditorsDE’s editors contribute news and new product announcements to Digital Engineering.
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